R+D / Applications

Growing nanostructures
Physical vapor deposition/thermal evaporation is one of the simplest and one of the the most popular synthesis methods as well as versatile to grow nano structures. A typical experimental system is shown in fig 1 below. An horizontal tube furnace loaded with high purity oxide powders are loaded in the tube center the highest temperature region.

The substrates are placed downstream following the carrier gas. A variety of substrates can be used. The end of the tube is capped and sealed with O rings Cooling water assists to maintain a reasonable temp gradient within the tube. The system is pumped down to around 1.10-2 Torr than the furnace is turned on to the reaction temp at a specific heating rate. The inert gas argon or nitrogen is introduced at a constant flow to bring the pressure back to approx 400 Torr different pressures are needed for different source materials.

The source material (s) can be vaporized at a high temperature and low pressure condition, the resulting vapor is carried by the gas Once it reaches the substrate nucleation and growth of nano wires occur. Similar processing is performed in our laboratories using this method for CVD.


Shown single pole MEMS relay for High frequency applications The device is normally open Actual size 5 x 5 mm Upon activation it will switch in < 1 micro second. Insulation R is 1.10.7
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Same as above multi pole relay shown in closed position
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Actual relay die
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Shown expanded view of movable aluminum mirrors
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Thin Film Air Bridge for H.F Devices

Digital Light Processor

100 x 100 micron DLP array (Nasa project)