Thin Films

Thin Films deposited using PVD, RF-DC Sputtering, Etching, and/or Evaporation


Materials processed in our Class 100 Facility

If your needs differ from this list, please contact our Applications Department at engineering@elume.comThis e-mail address is being protected from spambots. You need JavaScript enabled to view it

Metals:

  • Chromium
  • Titanium
  • AlSiCu
  • Copper
  • Nickel
  • Palladium
  • Gold
  • Silver
  • Molybdenum
  • Platinum
  • Rhodium
  • Indium
  • Tin
  • Germanium
  • Tungsten
  • Ruthenium Oxide (for P(L)ZT electrodes)
  • LSCO (for P(L)ZT electrodes)
  • Aluminum (also fusable for displays)

 

  1. Various compounds/oxides of the above including tri-metal
  2. ELume can up-plate as needed to 10micron
  3. Special precautions are taken with Au, Cu, platinum and others so as not to cross-contaminate the surface of these materials

 

Dielectrics:

  • Silicon Dioxide - SiO 2
  • Aluminum Oxide - Al 2 O 3
  • Tantalum Pentoxide - Ta 2 O 5
  • Silicon Nitride - SiN 3
  • Titanium Oxide - TiO 2
  • Germanium Oxide - GeO 2
  • Zirconium Oxide - ZrO 2
  • Yttrium Oxide - Y 2 O 3
  • Barium Titanate (Hi Q capacitors)
  • Others

Transparent Conductors:

  • Indium-tin-oxide (ITO)